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2007 Conference Publication Synthesis of Novel Polymer Resists for 193nm Immersion LithographyChen, Lan, Blakey, Idriss, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Lui, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis of Novel Polymer Resists for 193nm Immersion Lithography. 29th Australasian Polymer Symposium, Hobart, 11-15 February, 2007. Tasmania: Royal Australian Chemical Institute. |
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2007 Conference Publication Novel high-index resists for 193nm immersion lithography and beyondBlakey, Idriss, Chen, Lan, Dargaville, Bronwin, Lui, Heping, Whittaker, Andrew, Conley, Will, Piscani, Emil, Rich, George, Williams, Alvina and Zimmerman, Paul (2007). Novel high-index resists for 193nm immersion lithography and beyond. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, 26 February, 2007. Bellingham WA, USA: SPIE. doi: 10.1117/12.715108 |
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2007 Conference Publication The rational design of polymeric EUV resist materials by QSPR modellingJack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin and Whittaker, Andrew (2007). The rational design of polymeric EUV resist materials by QSPR modelling. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, 26 February, 2007. USA: The International Society for Optical Engineering. doi: 10.1117/12.716213 |
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2006 Conference Publication Characterisation of hybrid gold-polymer nanoparticles for use in bioassaysSchiller, T. L., Fredericks, P. M., Merican, Z. and Blakey, I. (2006). Characterisation of hybrid gold-polymer nanoparticles for use in bioassays. 2006 International Conference on Nanoscience and Nanotechnology, ICONN, Brisbane, Australia, 3-7 July, 2006. Piscataway, New Jersey: IEEE. doi: 10.1109/ICONN.2006.340696 |
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2006 Conference Publication Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography: A progress reportBlakey, I, Conley, W, George, GA, Hill, DJT, Liu, HP, Rasoul, F and Whittaker, AK (2006). Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography: A progress report. Advances in Resist Technology and Processing XXIII, San Jose, CA, USA, 20 February, 2006. Bellingham WA, USA: SPIE. doi: 10.1117/12.659757 |
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2006 Conference Publication Synthesis and characterisation of hybrid polymer-gold nanoparticles: Towards novel biosensorsMerican, Zul, Schiller, Tara l., Fredericks, Peter M. and Blakey, Idriss (2006). Synthesis and characterisation of hybrid polymer-gold nanoparticles: Towards novel biosensors. 2006 International Conference on Nanoscience and Nanotechnology, Brisbane, Qld, Australia, 3-7 Jul 2006. New York, USA: IEEE. doi: 10.1109/ICONN.2006.340695 |
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2006 Conference Publication SANS of four-layer polyelectroyte nanoparticles assembled using layer-by-layer depositionBaldwin, K., Bell, C. A., Blakey, I., Friese, M., Gentle, I., Schiller, T. L., Talbot, C. and Whittaker, A. (2006). SANS of four-layer polyelectroyte nanoparticles assembled using layer-by-layer deposition. Australian Polymer Symposium (APS), Rotorua, New Zealand, 5-9 February 2006. |
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2005 Conference Publication High-RI resist polymers for 193 nm immersion lithographyWhittaker, AK, Blakey, I, Liu, HP, Hill, DJT, George, GA, Conley, W and Zimmerman, P (2005). High-RI resist polymers for 193 nm immersion lithography. Conference on Advances in Resist Technology and Processing XXII, San Jose, CA, United States, 28 February - 2 March 2005. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.600630 |
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2001 Conference Publication Modeling, experimental evidence, and practical consequences of the infectious spreading of oxidative degradation in polymers.George, G, Blakey, I, Goss, B and Grigg, M (2001). Modeling, experimental evidence, and practical consequences of the infectious spreading of oxidative degradation in polymers.. WASHINGTON: AMER CHEMICAL SOC. |
