Skip to menu Skip to content Skip to footer

2010

Conference Publication

Novel supramolecular hydrogels as artificial vitreous substitutes

Lee-Wang, Hui Hui, Blakey, Idriss, Chirila, Traian V., Peng, Hui, Rasoul, Firas, Whittaker, Andrew K. and Dargaville, Bronwin L. (2010). Novel supramolecular hydrogels as artificial vitreous substitutes. 12th European-Polymer-Federation Congress, Graz, Austria, July 12-17 2009. F. Stelzer: E. Wiesbrock. doi: 10.1002/masy.201051032

Novel supramolecular hydrogels as artificial vitreous substitutes

2009

Conference Publication

COLL 351-Polymer stabilized aggregates of gold nanoparticles encoded with surface enhanced Raman spectroscopy molecular barcodes

Blakey, Idriss, Schiller, Tara L., Merican, Zul, Hawker, Craig J. and Fredericks, Peter M. (2009). COLL 351-Polymer stabilized aggregates of gold nanoparticles encoded with surface enhanced Raman spectroscopy molecular barcodes. WASHINGTON: AMER CHEMICAL SOC.

COLL 351-Polymer stabilized aggregates of gold nanoparticles encoded with surface enhanced Raman spectroscopy molecular barcodes

2009

Conference Publication

Simultaneous swelling and degradation of crosslinked PEG-PLLA networks

Peng, Hui, Chua, Xiaoying, Chuang, Yami, Blakey, Idriss, Dargaville, Bronwin, Rasoul, Firas, Symons, Anne, Varanasi, Srini and Whittaker, Andrew K. (2009). Simultaneous swelling and degradation of crosslinked PEG-PLLA networks. WASHINGTON: AMER CHEMICAL SOC.

Simultaneous swelling and degradation of crosslinked PEG-PLLA networks

2009

Conference Publication

Development of polymers for non-CAR resists for EUV lithography

Whittaker, Andrew K., Blakey, Idriss, Blinco, James, Jack, Kevin S., Lawrie, Kirsten, Liu, Heping, Yu, Anguang, Leeson, Michael, Yeuh, Wang and Younkin, Todd (2009). Development of polymers for non-CAR resists for EUV lithography. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, United States, 23-25 February 2009. Bellingham, WA, United States: S P I E - International Society for Optical Engineering. doi: 10.1117/12.820493

Development of polymers for non-CAR resists for EUV lithography

2009

Conference Publication

Simultaneous swelling and degradation of crosslinked PEG-PLLA networks

Peng, Hui, Chua, Xiaoying, Chuang, Yami, Blakey, Idriss, Dargaville, Bronwin, Rasoul, Firas, Symons, Anne, Varanasi, Srini and Whittaker, Andrew K. (2009). Simultaneous swelling and degradation of crosslinked PEG-PLLA networks. 238th ACS National Meeting, Washington, DC, U.S.A, 16-20 August 2009.

Simultaneous swelling and degradation of crosslinked PEG-PLLA networks

2009

Conference Publication

Synthesis and evaluation of novel partly-fluorinated block copolymers as MRI imaging agents

Peng, H., Blakey, I., Dargaville, B., Rasoul, F., Rose, S. and Whittaker, A. K. (2009). Synthesis and evaluation of novel partly-fluorinated block copolymers as MRI imaging agents. unknown, unknown, unknown. WASHINGTON: AMER CHEMICAL SOC.

Synthesis and evaluation of novel partly-fluorinated block copolymers as MRI imaging agents

2009

Conference Publication

Effect of solvent quality on the solution properties of assemblies of amphiphilic diblock copolymers as potential F-19 MRI agents

Peng, Hui, Blakey, Idriss, Dargaville, Bronwin, Rasoul, Firas and Whittaker, Andrew K. (2009). Effect of solvent quality on the solution properties of assemblies of amphiphilic diblock copolymers as potential F-19 MRI agents. National Meeting of the American Chemical Society, *, 2009. Washington, DC United States: American Chemical Society.

Effect of solvent quality on the solution properties of assemblies of amphiphilic diblock copolymers as potential F-19 MRI agents

2009

Conference Publication

Healing of polymer resists with block copolymers

Cheng, H. H., Keen, I., Yu, A., Blinco, J., Blakey, I., Jack, K., Younkin, T. and Whittaker, A. K. (2009). Healing of polymer resists with block copolymers. 11th Pacific Polymer Conference (PPC11), Cairns, Qld., Australia, 6-10 December 2009.

Healing of polymer resists with block copolymers

2009

Conference Publication

Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity

Blakey, Idriss, Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Ya-mi, Piscani, Emil, Zimmerman, Paul A. and Whittaker, Andrew K. (2009). Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, USA, 23 February, 2009. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.814076

Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity

2009

Conference Publication

Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performance

Peng, H., Chua, X., Blakey, I., Dargaville, B., Rasoul, F., Symons, A. L., Varanasi, S. and Whittaker, A. K. (2009). Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performance. 237th ACS Spring National Meeting and Exposition, Salt Lake City, UT, U.S.A., 22-26 March 2009. Washington, DC, U.S.A.: American Chemical Society.

Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performance

2009

Conference Publication

Development of block copolymers for improved surface directed self assembly

Keen, Imelda, Cheng, Elliot, Yu, Anguang, Blakey, Idriss, Jack, Kevin, Drennan, John, Younkin, Todd and Whittaker, Andrew K. (2009). Development of block copolymers for improved surface directed self assembly. PPC11: Progress in Polymers for the New Millennium. 11th Pacific Polymer Conference 2009 incorporating the 31st Australasian Polymer Symposium, Cairns, QLD, Australia, 6-10 December 2009. Hobart, TAS, Australia: Leishman Associates.

Development of block copolymers for improved surface directed self assembly

2008

Conference Publication

High pressure NMR of polymeric materials

Whittaker, Andrew K., Blakey, Idriss, Thurecht, Kristofer J., Squires, Oliver and Varcoe, Kylie (2008). High pressure NMR of polymeric materials. 235th American Chemical Society National Meeting, New Orleans, 6-10 April 2008 . Blacksburg, VA, United States: American Chemical Society.

High pressure NMR of polymeric materials

2008

Conference Publication

POLY 236-Synthesis of linear and branched poly(trimethylene carbonate-co-lactide) copolymers and an investigation of chemical structure on hydrolytic degradation.

Truong, V, Whittaker, AK and Blakey, I (2008). POLY 236-Synthesis of linear and branched poly(trimethylene carbonate-co-lactide) copolymers and an investigation of chemical structure on hydrolytic degradation.. 236th National Meeting of the American-Chemical-Society, Philadelphia PA, AUG 17-21, 2008. WASHINGTON: AMER CHEMICAL SOC.

POLY 236-Synthesis of linear and branched poly(trimethylene carbonate-co-lactide) copolymers and an investigation of chemical structure on hydrolytic degradation.

2008

Conference Publication

Synthesis of polycarbonates for EUV lithography

Yu, Anguang, Blinco, James, Blakey, Idriss, Younkin, Todd, Leeson, Michael and Whittaker, Andrew (2008). Synthesis of polycarbonates for EUV lithography. 30th Australasian Polymer Symposium (30APS), Melbourne, Vic., Australia, 30 November - 4 December, 2008. RACI Polymer Division.

Synthesis of polycarbonates for EUV lithography

2008

Conference Publication

POLY 624-High pressure NMR of polymeric materials

Whittaker, AK, Blakey, I, Thurecht, KJ, Squires, O and Varcoe, K (2008). POLY 624-High pressure NMR of polymeric materials. 235th American-Chemical-Society National Meeting, New Orleans LA, APR 06-10, 2008. WASHINGTON: AMER CHEMICAL SOC.

POLY 624-High pressure NMR of polymeric materials

2008

Conference Publication

Development of an operational high refractive index resist for 193nm immersion lithography

Zimmerman, Paul A., Byers, Jeff, Piscani, Emil, Rice, Bryan, Ober, Christopher K., Giannelis, Emmanuel P., Rodriguez, Robert, Wang, Dongyan, Whittaker, Andrew, Blakey, Idriss, Chen, Lan, Dargaville, Bronwin and Liu, Heping (2008). Development of an operational high refractive index resist for 193nm immersion lithography. Advances in Resist Materials and Processing Technology XXV, San Jose, CA, USA, 25 February 2008. Bellingham, WA, USA: SPIE. doi: 10.1117/12.772871

Development of an operational high refractive index resist for 193nm immersion lithography

2007

Conference Publication

The conformation of polymer molecules studied by Hyper-polarised 129Xenon NMR

Baldwin, Katie, Blakey, Idriss, Talbot, Cavin, Wang, Deming, Friese, Marlies and Whittaker, Andrew K. (2007). The conformation of polymer molecules studied by Hyper-polarised 129Xenon NMR. 29th Australasian Polymer Symposium, Hobart, Tasmania, 11-15 February, 2007. Tasmania: Royal Australian Chemical Institute.

The conformation of polymer molecules studied by Hyper-polarised 129Xenon NMR

2007

Conference Publication

Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion Lithography

Dargaville, Bronwin, Blakey, Idriss, Chen, Lan, Conley, Will, George, Graeme A., Hill, David J.T., Liu, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion Lithography. 29th Australasian Polymer Symposium, Hobart, Tasmania, 11-15 February 2007. Tasmania: Royal Australian Chemical Institute.

Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion Lithography

2007

Conference Publication

Novel high-index resists for 193nm immersion lithography and beyond

Blakey, Idriss, Chen, Lan, Dargaville, Bronwin, Lui, Heping, Whittaker, Andrew, Conley, Will, Piscani, Emil, Rich, George, Williams, Alvina and Zimmerman, Paul (2007). Novel high-index resists for 193nm immersion lithography and beyond. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, 26 February, 2007. Bellingham WA, USA: SPIE. doi: 10.1117/12.715108

Novel high-index resists for 193nm immersion lithography and beyond

2007

Conference Publication

Synthesis of Novel Polymer Resists for 193nm Immersion Lithography

Chen, Lan, Blakey, Idriss, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Lui, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis of Novel Polymer Resists for 193nm Immersion Lithography. 29th Australasian Polymer Symposium, Hobart, 11-15 February, 2007. Tasmania: Royal Australian Chemical Institute.

Synthesis of Novel Polymer Resists for 193nm Immersion Lithography