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2011 Journal Article Polysulfone based Non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivityChen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Yami, Piscani, Emil, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2011). Polysulfone based Non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivity. Radiation Physics And Chemistry, 80 (2), 242-247. doi: 10.1016/j.radphyschem.2010.07.040 |
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2011 Conference Publication Sensitive polysulfone based chain scissioning resists for 193 nm lithographyGoh, Yong Keng, Chen, Lan, Dorgelo, Anneke, Peng, Xie, Lafferty, Neal, Smith, Bruce, Zimmerman, Paul, Montgomery, Warren, Blakey, Idriss and Whittaker, Andrew K. (2011). Sensitive polysulfone based chain scissioning resists for 193 nm lithography. Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States, 28 February - 2 March 2011. Bellingham, WA, United States: S P I E - International Society for Optical Engineering. doi: 10.1117/12.881700 |
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2011 Conference Publication F2 excimer laser (157 nm) radiation modification and surface ablation of PHEMA hydrogels and the effects on bioactivity: Surface attachment and proliferation of human corneal epithelial cellsZainuddin, Chirila, Traian V., Barnard, Zeke, Watson, Gregory S., Toh, Chiong, Blakey, Idriss, Whittaker, Andrew K. and Hill, David J. T. (2011). F2 excimer laser (157 nm) radiation modification and surface ablation of PHEMA hydrogels and the effects on bioactivity: Surface attachment and proliferation of human corneal epithelial cells. 11th Pacific Polymer Conference, Cairns, Australia, 6-10 December 2009. Oxford, United Kingdom: Pergamon. doi: 10.1016/j.radphyschem.2010.07.036 |
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2011 Conference Publication Study of directed self assembly of block copolymer with positive tone resistsCheng, H. H., Keen, I., Blakey, I., Jack, K., Leeson, M., Younkin, T. and Whittaker, A. K. (2011). Study of directed self assembly of block copolymer with positive tone resists. 32APS: Australasian Polymer Symposium, Coffs Harbour, NSW, Australia, 13-16 February 2011. Hobart, TAS, Australia: Leishman Associates. |
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2011 Conference Publication Electron-beam-induced freezing of a positive tone EUV resist for use in directed self-assembly applicationsCheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Electron-beam-induced freezing of a positive tone EUV resist for use in directed self-assembly applications. Alternative Lithographic Technologies III, San Jose, CA, United States, 1-3 March 2011. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.881491 |
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2011 Conference Publication Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresistsLawrie, Kirsten, Blakey, Idriss, Blinco, James, Gronheid, Roel, Jack, Kevin, Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists. 11th Pacific Polymer Conference, Cairns, Australia, 6-10 December 2009. Kidlington, Oxford, U. K.: Pergamon. doi: 10.1016/j.radphyschem.2010.07.038 |
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2011 Book Chapter Effect of molecular architecture on the performance of (19)F NMR imaging agentsPeng, Hui, Thurecht, Kristofer, Hsu, Steven, Blakey, Idriss, Squires, Oliver, Kurniawan, Nyoman, Rose, Stephen and Whittaker, Andrew (2011). Effect of molecular architecture on the performance of (19)F NMR imaging agents. NMR Spectroscopy of Polymers: Innovative Strategies for Complex Macromolecules. (pp. 459-472) edited by H. N. Cheng, Tetsuo Asakur and Alan D. English. Washington, DC, United States: American Chemical Society. doi: 10.1021/bk-2011-1077.ch028 |
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2011 Conference Publication Effect of nanoholes on the plasmonic properties of star nanostructuresZhu, Shaoli, Whittaker, Andrew K. and Blakey, Idriss (2011). Effect of nanoholes on the plasmonic properties of star nanostructures. Conference on Smart Nano-Micro Materials and Devices/SPIE Smart Nano + Micro Materials and Devices Forum, Melbourne, Australia, 5-7 December 2011. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.905409 |
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2011 Conference Publication Synthesis of molecularly imprinted organic-inorganic hybrid azobenzene materials by sol-gel for radiation induced selective recognition of 2,4-dichlorophenoxyacetic acidJiang, Guang Shuai, Zhong, Shi An, Chen, Lan, Blakey, Idriss and Whittaker, Andrew (2011). Synthesis of molecularly imprinted organic-inorganic hybrid azobenzene materials by sol-gel for radiation induced selective recognition of 2,4-dichlorophenoxyacetic acid. 11th Pacific Polymer Conference PPC11, Cairns, Qld, Australia, 6-10 December, 2009. Oxford, U.K.: Pergamon Press. doi: 10.1016/j.radphyschem.2010.07.020 |
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2011 Conference Publication Controlling the morphology and orientation of PS-b-PDLA block copolymersKeen, Imelda, Yu, Anguang, Cheng, Elliot, Blakey, Idriss, Leeson, Michael, Younkin, Todd and Whittaker, Andrew (2011). Controlling the morphology and orientation of PS-b-PDLA block copolymers. 32APS: Australasian Polymer Symposium, Coffs Harbour, NSW, Australia, 13-16 February 2011. Hobart, TAS, Australia: Leishman Associates. |
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2010 Conference Publication Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithographyBlakey, Idriss, Yu, Anguang, Blinco, James, Jack, Kevin S., Liu, Heping, Leeson, Michael, Yeuh, Wang, Younkin, Todd and Whittaker, Andrew (2010). Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography. Extreme Ultraviolet (EUV) Lithography, San Jose, California, U.S.A., 22 February, 2010. Washington, DC, U.S.A.: SPIE. doi: 10.1117/12.853620 |
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2010 Conference Publication Novel supramolecular hydrogels as artificial vitreous substitutesLee-Wang, Hui Hui, Blakey, Idriss, Chirila, Traian V., Peng, Hui, Rasoul, Firas, Whittaker, Andrew K. and Dargaville, Bronwin L. (2010). Novel supramolecular hydrogels as artificial vitreous substitutes. 12th European-Polymer-Federation Congress, Graz, Austria, July 12-17 2009. F. Stelzer: E. Wiesbrock. doi: 10.1002/masy.201051032 |
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2010 Conference Publication Non-chemically amplified resists for 193-nm immersion lithography: Influence of absorbance on performanceChen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Smith, Bruce, Montgomery, Warren, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2010). Non-chemically amplified resists for 193-nm immersion lithography: Influence of absorbance on performance. Advances in Resist Materials and Processing Technology XXVII, San Jose, California, U.S.A., 22-24 February, 2010. Washington, DC, U.S.A.: SPIE. doi: 10.1117/12.846971 |
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2009 Conference Publication COLL 351-Polymer stabilized aggregates of gold nanoparticles encoded with surface enhanced Raman spectroscopy molecular barcodesBlakey, Idriss, Schiller, Tara L., Merican, Zul, Hawker, Craig J. and Fredericks, Peter M. (2009). COLL 351-Polymer stabilized aggregates of gold nanoparticles encoded with surface enhanced Raman spectroscopy molecular barcodes. WASHINGTON: AMER CHEMICAL SOC. |
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2009 Conference Publication Simultaneous swelling and degradation of crosslinked PEG-PLLA networksPeng, Hui, Chua, Xiaoying, Chuang, Yami, Blakey, Idriss, Dargaville, Bronwin, Rasoul, Firas, Symons, Anne, Varanasi, Srini and Whittaker, Andrew K. (2009). Simultaneous swelling and degradation of crosslinked PEG-PLLA networks. WASHINGTON: AMER CHEMICAL SOC. |
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2009 Journal Article Synthesis and evaluation of partly fluorinated block copolymers as MRI imaging agentsPeng, Hui, Blakey, IIdriss, Dargaville, Bronwin, Rasoul, Firas, Rose, Stephen and Whittaker, Andrew K. (2009). Synthesis and evaluation of partly fluorinated block copolymers as MRI imaging agents. Biomacromolecules, 10 (2), 374-381. doi: 10.1021/bm801136m |
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2009 Conference Publication Healing of polymer resists with block copolymersCheng, H. H., Keen, I., Yu, A., Blinco, J., Blakey, I., Jack, K., Younkin, T. and Whittaker, A. K. (2009). Healing of polymer resists with block copolymers. 11th Pacific Polymer Conference (PPC11), Cairns, Qld., Australia, 6-10 December 2009. |
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2009 Conference Publication Development of polymers for non-CAR resists for EUV lithographyWhittaker, Andrew K., Blakey, Idriss, Blinco, James, Jack, Kevin S., Lawrie, Kirsten, Liu, Heping, Yu, Anguang, Leeson, Michael, Yeuh, Wang and Younkin, Todd (2009). Development of polymers for non-CAR resists for EUV lithography. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, United States, 23-25 February 2009. Bellingham, WA, United States: S P I E - International Society for Optical Engineering. doi: 10.1117/12.820493 |
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2009 Conference Publication Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performancePeng, H., Chua, X., Blakey, I., Dargaville, B., Rasoul, F., Symons, A. L., Varanasi, S. and Whittaker, A. K. (2009). Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performance. 237th ACS Spring National Meeting and Exposition, Salt Lake City, UT, U.S.A., 22-26 March 2009. Washington, DC, U.S.A.: American Chemical Society. |
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2009 Conference Publication Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivityBlakey, Idriss, Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Ya-mi, Piscani, Emil, Zimmerman, Paul A. and Whittaker, Andrew K. (2009). Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, USA, 23 February, 2009. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.814076 |
