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2009 Conference Publication Development of polymers for non-CAR resists for EUV lithographyWhittaker, Andrew K., Blakey, Idriss, Blinco, James, Jack, Kevin S., Lawrie, Kirsten, Liu, Heping, Yu, Anguang, Leeson, Michael, Yeuh, Wang and Younkin, Todd (2009). Development of polymers for non-CAR resists for EUV lithography. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, United States, 23-25 February 2009. Bellingham, WA, United States: S P I E - International Society for Optical Engineering. doi: 10.1117/12.820493 |
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2009 Conference Publication Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performancePeng, H., Chua, X., Blakey, I., Dargaville, B., Rasoul, F., Symons, A. L., Varanasi, S. and Whittaker, A. K. (2009). Functional PEG-PLLA networks for dental bone repair: Effect of network chemistry on properties and performance. 237th ACS Spring National Meeting and Exposition, Salt Lake City, UT, U.S.A., 22-26 March 2009. Washington, DC, U.S.A.: American Chemical Society. |
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2009 Conference Publication Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivityBlakey, Idriss, Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Ya-mi, Piscani, Emil, Zimmerman, Paul A. and Whittaker, Andrew K. (2009). Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, USA, 23 February, 2009. Bellingham, WA, United States: SPIE - International Society for Optical Engineering. doi: 10.1117/12.814076 |
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2009 Conference Publication Effect of solvent quality on the solution properties of assemblies of amphiphilic diblock copolymers as potential F-19 MRI agentsPeng, Hui, Blakey, Idriss, Dargaville, Bronwin, Rasoul, Firas and Whittaker, Andrew K. (2009). Effect of solvent quality on the solution properties of assemblies of amphiphilic diblock copolymers as potential F-19 MRI agents. National Meeting of the American Chemical Society, *, 2009. Washington, DC United States: American Chemical Society. |
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2008 Conference Publication High pressure NMR of polymeric materialsWhittaker, Andrew K., Blakey, Idriss, Thurecht, Kristofer J., Squires, Oliver and Varcoe, Kylie (2008). High pressure NMR of polymeric materials. 235th American Chemical Society National Meeting, New Orleans, 6-10 April 2008 . Blacksburg, VA, United States: American Chemical Society. |
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2008 Conference Publication Development of an operational high refractive index resist for 193nm immersion lithographyZimmerman, Paul A., Byers, Jeff, Piscani, Emil, Rice, Bryan, Ober, Christopher K., Giannelis, Emmanuel P., Rodriguez, Robert, Wang, Dongyan, Whittaker, Andrew, Blakey, Idriss, Chen, Lan, Dargaville, Bronwin and Liu, Heping (2008). Development of an operational high refractive index resist for 193nm immersion lithography. Advances in Resist Materials and Processing Technology XXV, San Jose, CA, USA, 25 February 2008. Bellingham, WA, USA: SPIE. doi: 10.1117/12.772871 |
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2008 Conference Publication POLY 624-High pressure NMR of polymeric materialsWhittaker, AK, Blakey, I, Thurecht, KJ, Squires, O and Varcoe, K (2008). POLY 624-High pressure NMR of polymeric materials. 235th American-Chemical-Society National Meeting, New Orleans LA, APR 06-10, 2008. WASHINGTON: AMER CHEMICAL SOC. |
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2008 Conference Publication Synthesis of polycarbonates for EUV lithographyYu, Anguang, Blinco, James, Blakey, Idriss, Younkin, Todd, Leeson, Michael and Whittaker, Andrew (2008). Synthesis of polycarbonates for EUV lithography. 30th Australasian Polymer Symposium (30APS), Melbourne, Vic., Australia, 30 November - 4 December, 2008. RACI Polymer Division. |
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2008 Conference Publication POLY 236-Synthesis of linear and branched poly(trimethylene carbonate-co-lactide) copolymers and an investigation of chemical structure on hydrolytic degradation.Truong, V, Whittaker, AK and Blakey, I (2008). POLY 236-Synthesis of linear and branched poly(trimethylene carbonate-co-lactide) copolymers and an investigation of chemical structure on hydrolytic degradation.. 236th National Meeting of the American-Chemical-Society, Philadelphia PA, AUG 17-21, 2008. WASHINGTON: AMER CHEMICAL SOC. |
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2007 Journal Article Use of 9,10-diphenylanthracene as a contrast agent in chemiluminescence imaging: the observation of spreading of oxidative degradation in thin polypropylene filmsBlakey, I, Billingham, N and George, GA (2007). Use of 9,10-diphenylanthracene as a contrast agent in chemiluminescence imaging: the observation of spreading of oxidative degradation in thin polypropylene films. Polymer Degradation and Stability, 92 (11), 2102-2109. doi: 10.1016/j.polymdegradstab.2007.07.020 |
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2007 Journal Article Status of High-Index Materials for Generation-Three 193nm Immersion LithographyZimmerman, Paul A., Van Peski, Chris, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothschild, Mordy, Whittaker, Andrew K., Blakey, Idriss, Chen, Lan, Dargaville, Bronwin and Liu, Heping (2007). Status of High-Index Materials for Generation-Three 193nm Immersion Lithography. Journal of Photopolymer Science and Technology, 20 (5), 643-650. doi: 10.2494/photopolymer.20.643 |
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2007 Conference Publication The conformation of polymer molecules studied by Hyper-polarised 129Xenon NMRBaldwin, Katie, Blakey, Idriss, Talbot, Cavin, Wang, Deming, Friese, Marlies and Whittaker, Andrew K. (2007). The conformation of polymer molecules studied by Hyper-polarised 129Xenon NMR. 29th Australasian Polymer Symposium, Hobart, Tasmania, 11-15 February, 2007. Tasmania: Royal Australian Chemical Institute. |
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2007 Book Chapter The effect of synthetic conditions on the free volume of poly (2-hydroxyethyl methacrylate) as studied by 1H NMR, 129 Xe NMR, and position annihilation spectroscopyVacroe, K. M., Blakey, I., Chirila, T. V., Hill, A. J. and Whittaker, A. K. (2007). The effect of synthetic conditions on the free volume of poly (2-hydroxyethyl methacrylate) as studied by 1H NMR, 129 Xe NMR, and position annihilation spectroscopy. New approaches in biomedical spectroscopy. (pp. 391-409) edited by Katrin Kneipp, Ricardo Aroca, Harald Kneipp and Edeline Wentrup-Byrne. Washington, D.C., U.S.A.: American Chemical Society. doi: 10.1021/bk-2007-0963.ch024 |
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2007 Journal Article Rational Design of High-RI Resists for 193nm Immersion LithographyWhittaker, Andrew K., Blakey, Idriss, Chen, Lan, Dargaville, Bronwin L., Liu, Heping, Conley, Will and Zimmerman, Paul A. (2007). Rational Design of High-RI Resists for 193nm Immersion Lithography. Journal of Photopolymer Science and Technology, 20 (5), 665-671. doi: 10.2494/photopolymer.20.665 |
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2007 Conference Publication The rational design of polymeric EUV resist materials by QSPR modellingJack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin and Whittaker, Andrew (2007). The rational design of polymeric EUV resist materials by QSPR modelling. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, 26 February, 2007. USA: The International Society for Optical Engineering. doi: 10.1117/12.716213 |
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2007 Conference Publication Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion LithographyDargaville, Bronwin, Blakey, Idriss, Chen, Lan, Conley, Will, George, Graeme A., Hill, David J.T., Liu, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion Lithography. 29th Australasian Polymer Symposium, Hobart, Tasmania, 11-15 February 2007. Tasmania: Royal Australian Chemical Institute. |
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2007 Conference Publication Novel high-index resists for 193nm immersion lithography and beyondBlakey, Idriss, Chen, Lan, Dargaville, Bronwin, Lui, Heping, Whittaker, Andrew, Conley, Will, Piscani, Emil, Rich, George, Williams, Alvina and Zimmerman, Paul (2007). Novel high-index resists for 193nm immersion lithography and beyond. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, 26 February, 2007. Bellingham WA, USA: SPIE. doi: 10.1117/12.715108 |
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2007 Conference Publication Synthesis of Novel Polymer Resists for 193nm Immersion LithographyChen, Lan, Blakey, Idriss, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Lui, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis of Novel Polymer Resists for 193nm Immersion Lithography. 29th Australasian Polymer Symposium, Hobart, 11-15 February, 2007. Tasmania: Royal Australian Chemical Institute. |
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2007 Conference Publication The Effect of Synthetic Conditions on the Free Volume of Poly(2-hydroxyethyl methacrylate) as Studied by H-1 NMR, Xe-129 NMR, and Position Annihilation SpectroscopyVarcoe, Kylie M., Blakey, Idriss, Chirila, Traian V., Hill, Anita J. and Whittaker, Andrew K. (2007). The Effect of Synthetic Conditions on the Free Volume of Poly(2-hydroxyethyl methacrylate) as Studied by H-1 NMR, Xe-129 NMR, and Position Annihilation Spectroscopy. Symposium on New Approaches in Biomedical Spectroscopy, Honolulu, HI, United States, December 2005. Washington, DC, United States: American Chemical Society. doi: 10.1021/bk-2007-0963.ch024 |
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2007 Conference Publication From Structure Property Relationship to Molecular DesignLiu, Heping, Blakey, Idriss, Chen, Lan, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). From Structure Property Relationship to Molecular Design. 29th Australasian Polymer Symposium, Hobart, 11-15 February 2007. Tasmania: Royal Australian Chemical Institute. |
