High-resolution Lithographic Polymers - Next Generation Integrated Circuits
Abstract
Our modern electronic devices rely on rapid and energy-efficient integrated circuits. Integrated circuits are produced using a technology called photolithography, in which a photosensitive polymer is used to create circuits and transistors on a silicon wafer. However, photolithography is reaching a technical limit and new approaches are desperately needed. This project aims to develop the next generation of photosensitive polymers, to enable smaller features to be printed in integrated circuits. The polymers utilise a unique mechanism in which they degrade on exposure to light. In addition to manufacture of computer chips the polymers can potentially have broader applications in various high technology fields.